Two principal methods exist within electron microscopy, each offering unique capabilities for material analysis. One method projects a beam of electrons through a thinly prepared sample, creating an image based on the interaction of electrons as they pass through. The resulting image reveals the internal structure of the specimen with high resolution. The other method scans a focused beam of electrons across the surface of a sample. The electrons interact with the sample, generating signals that are detected to create an image representing the surface topography and composition.
These contrasting approaches are vital in various scientific and industrial fields. The capacity to visualize internal structures at the nanoscale level enables breakthroughs in materials science, biology, and nanotechnology. Surface imaging allows detailed examination of surface features, defects, and coatings, contributing to quality control and product development. The initial development of these technologies revolutionized microscopy, extending the boundaries of observable phenomena beyond the limitations of light-based systems.
